Author: Blick, R.H.
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SUPFDV020 ALD-Based NbIiN Studies for SIS R&D 109
  • I. González Díaz-Palacio, R.H. Blick, R. Zierold
    University of Hamburg, Hamburg, Germany
  • W. Hillert, M. Wenskat
    University of Hamburg, Institut für Experimentalphysik, Hamburg, Germany
  Superconductor-Insulator-Superconductor multilayers improve the performance of SRF cavities providing magnetic screening of the bulk cavity and lower surface resistance. In this framework NbTiN mixtures stand as a potential material of interest. Atomic layer deposition (ALD) allows for uniform coating of complex geometries and enables tuning of the stoichiometry and precise thickness control in sub-nm range. In this talk, we report about NbTiN thin films deposited by plasma-enhanced ALD on insulating AlN buffer layer. The deposition process has been optimized by studying the superconducting electrical properties of the films. Post-deposition thermal annealing studies with varying temperatures, annealing times, and gas atmospheres have been performed to further improve the thin film quality and the superconducting properties. Our experimental studies show an increase in Tc by 87.5% after thermal annealing and a maximum Tc of 13.9 K has been achieved for NbTiN of 23 nm thickness. Future steps include lattice characterization, using XRR/XRD/EBSD/PALS, and SRF measurements to obtain Hc1 and the superconducting gap.  
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About • Received ※ 22 June 2021 — Revised ※ 17 August 2021 — Accepted ※ 17 August 2021 — Issue date ※ 19 January 2022
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