Author: Brisset, F.
Paper Title Page
MOPFDV001 Investigation of an Alternative Path for SRF Cavity Fabrication and Surface Processing 319
 
  • O. Hryhorenko, D. Longuevergne
    Université Paris-Saclay, CNRS/IN2P3, IJCLab, Orsay, France
  • C.Z. Antoine
    CEA-IRFU, Gif-sur-Yvette, France
  • F. Brisset
    ICMMO, Orsay, France
  • T. Dohmae
    KEK, Ibaraki, Japan
 
  The preparation of SRF cavities includes a lengthy, costly, and safety issued electrochemical polishing (EP or BCP) step to remove the damaged layer coming from the cavity fabrication. We have shown that most of the damage layer is originated from the rolling process during the preparation of the sheet material, while subsequent deep drawing tends to leave only µm thick damage layer. We propose a 2-steps mechanical process that allows us to easily get rid of the thick damage layer on the sheets before cavity forming. The process has been established on samples and extended to large disks ready for 1.3 GHz half-cell forming. The polished sheets will be then sent to KEK for half-cell forming and subsequent surface and material analysis before proceeding to half-cell welding. Former studies on the sample demonstrated that damages induced by forming can successfully be removed by recrystallization and less than 10 µm final chemistry.  
poster icon Poster MOPFDV001 [2.303 MB]  
DOI • reference for this paper ※ https://doi.org/10.18429/JACoW-SRF2021-MOPFDV001  
About • Received ※ 25 June 2021 — Revised ※ 11 July 2021 — Accepted ※ 21 August 2021 — Issue date ※ 15 May 2022
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