Author: Cavellier, M.
Paper Title Page
MOPCAV009 A New Process for Nitrogen Doping of Niobium Cavities 276
  • M. Cavellier
    Omega Physics, St Gildas de Rhuys, France
  Nitrogen-doping of Niobium cavities is now well known and industrialization of this process is emerging. However, the current process, based on thermal treatment in Nitrogen atmosphere leads to various inaccuracies (what is the concentration of Nitrogen in the Nb material? Penetration depth, created phases, …) and some post-treatment like chemical-mechanical polishing of the inner surface. This work presents a new and more accurate patented process based on nitrogen ion beam implantation into the inner surface of Nb cavities. Ion implantation is a well-known, controlled, accurate and reproducible process that does not require post-treatment. For these reasons, the industrialization of Nitrogen-doping Nb cavities will be improved through ion implantation.  
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About • Received ※ 19 June 2021 — Revised ※ 10 July 2021 — Accepted ※ 19 November 2021 — Issue date ※ 06 April 2022
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