Author: Kulina, G.
Paper Title Page
SUPTEV007 Development of a System for Coating SRF Cavities Using Remote Plasma CVD 129
  • G. Gaitan, P. Bishop, A.T. Holic, G. Kulina, M. Liepe, J. Sears, Z. Sun
    Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA
  Funding: This work was supported by the National Science Foundation under Grant No. PHY-1549132.
Next-generation, thin-film surfaces employing Nb3Sn, NbN, NbTiN, and other compound superconductors are destined to allow reaching superior RF performance levels in SRF cavities. Optimized, advanced deposition processes are required to enable high-quality films of such materials on large and complex-shaped cavities. For this purpose, Cornell University is developing a remote plasma-enhanced chemical vapor deposition (CVD) system that facilitates coating on complicated geometries with a high deposition rate. This system is based on a high-temperature tube furnace with a clean vacuum and furnace loading system. The use of plasma alongside reacting precursors will significantly reduce the required processing temperature and promote precursor decomposition. A vacuum quality monitor (VQM) is used to characterize the residual gases before coating. The CVD system has been designed and is currently under assembly and commissioning.
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About • Received ※ 09 July 2021 — Accepted ※ 21 August 2021 — Issue date; ※ 10 February 2022  
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