Author: Rabehasy, F.
Paper Title Page
TUPCAV002 HOM Excitation in Spoke Resonator for SRF Studies 435
  • D. Longuevergne, N. Bippus, F. Chatelet, V. Delpech, N. Hu, C. Joly, T. Pépin-Donat, F. Rabehasy, L. Renard
    Université Paris-Saclay, CNRS/IN2P3, IJCLab, Orsay, France
  • M. Baudrier
    CEA-DRF-IRFU, France
  • E. Cenni, L. Maurice
    CEA-IRFU, Gif-sur-Yvette, France
  The excitation of Higher Order Modes (HOM) or Lower Order Modes (LOM) has been performed for years on multi-cell superconducting accelerating cavities as a mean to coarsely locate a quench, a defective area or ignite a plasma for surface cleaning. Moreover, such multi-mode testing is very useful to understand more accurately the frequency dependence of the surface resistance in a wide range of surface magnetic fields (0<B<150mT). In that sense, several type of dedicated non-accelerating resonators like Quadrupole Resonator (QPR), Half- or Quarter- Wave resonators have been built to specifically study new superconducting materials or new surface or heat treatments. What is proposed in this paper is to perform such multi-mode analysis (352 MHz, 720 MHz and 1300 MHz) in an existing accelerating cavity, in particular a Spoke Resonator. Baseline results will be presented and perspectives of such technique will be discussed.  
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About • Received ※ 22 June 2021 — Revised ※ 19 July 2021 — Accepted ※ 23 August 2021 — Issue date ※ 15 April 2022
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WEPCAV002 Improvement of Chemical Etching Capabilities (BCP) for SRF Spoke Resonators at IJCLab 590
  • J. Demercastel-Soulier, P. Duchesne, D. Longuevergne, G. Olry, T. Pépin-Donat, F. Rabehasy, D. Reynet, S. Roset, L.M. Vogt
    Université Paris-Saclay, CNRS/IN2P3, IJCLab, Orsay, France
  Buffered chemical polishing (BPC) is the reference surface polishing adopted for ESS and MYRRHA SRF spoke resonators at IJCLab. This chemical treatment, in addition to improving the RF performance, fits into the frequency adjustment strategy of the jacketed cavity during its preparation phase. In the framework of the collaboration with Fermilab for PIP-II project, IJCLab has developed a new setup to perform rotational BCP. The implementation of a rotation during chemical etching improves significantly the homogeneity and quality of surface polishing. In this paper, we present the numerical analysis based on a fluid dynamics model. The goal is to estimate the acid flow characteristics inside the cavity, determine the influence of several parameters as mass flow rate and rotation speed and propose the best configuration for the new experimental setup  
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About • Received ※ 23 June 2021 — Revised ※ 18 August 2021 — Accepted ※ 21 August 2021 — Issue date ※ 14 January 2022
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