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RIS citation export for SUPTEV007: Development of a System for Coating SRF Cavities Using Remote Plasma CVD

AU  - Gaitan, G.
AU  - Bishop, P.
AU  - Holic, A.T.
AU  - Kulina, G.
AU  - Liepe, M.
AU  - Sears, J.
AU  - Sun, Z.
ED  - Saito, Kenji
ED  - Xu, Ting
ED  - Sakamoto, Naruhiko
ED  - Lesage, Ana
ED  - Schaa, Volker R.W.
TI  - Development of a System for Coating SRF Cavities Using Remote Plasma CVD
J2  - Proc. of SRF2021, East Lansing, MI, USA, 28 June-02 July 2021
CY  - East Lansing, MI, USA
T2  - International Conference on RF Superconductivity
T3  - 20
LA  - english
AB  - Next-generation, thin-film surfaces employing Nb₃Sn, NbN, NbTiN, and other compound superconductors are destined to allow reaching superior RF performance levels in SRF cavities. Optimized, advanced deposition processes are required to enable high-quality films of such materials on large and complex-shaped cavities. For this purpose, Cornell University is developing a remote plasma-enhanced chemical vapor deposition (CVD) system that facilitates coating on complicated geometries with a high deposition rate. This system is based on a high-temperature tube furnace with a clean vacuum and furnace loading system. The use of plasma alongside reacting precursors will significantly reduce the required processing temperature and promote precursor decomposition. A vacuum quality monitor (VQM) is used to characterize the residual gases before coating. The CVD system has been designed and is currently under assembly and commissioning.
PB  - JACoW Publishing
CP  - Geneva, Switzerland
SP  - 129
EP  - 132
KW  - cavity
KW  - plasma
KW  - vacuum
KW  - controls
DA  - 2022/10
PY  - 2022
SN  - 2673-5504
SN  - 978-3-95450-233-2
DO  - doi:10.18429/JACoW-SRF2021-SUPTEV007
UR  - https://jacow.org/srf2021/papers/suptev007.pdf
ER  -